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The characteristic of HfO2 on strained SiGe
The characteristic of HfO2 on strained SiGe
The characteristic of HfO2 on strained SiGe
Chen, T. C. (author) / Lee, L. S. (author) / Lai, W. Z. (author) / Liu, C. W. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 209-213
2005-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
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