Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Electrical Properties of Aluminum Oxide Films Grown by Atomic Layer Deposition on n-Type 4H-SiC

    New search for: Avice, M.
    New search for: Grossner, U.
    New search for: Monakhov, E. V.
    New search for: Grillenberger, J.
    New search for: Nilsen, O.
    New search for: Fjellvag, H.
    New search for: Svensson, B. G.
    New search for: Nipoti, R.
    New search for: Poggi, A.
    New search for: Scorzoni, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Electrical Properties of Aluminum Oxide Films Grown by Atomic Layer Deposition on n-Type 4H-SiC

    New search for: Avice, M.
    New search for: Grossner, U.
    New search for: Monakhov, E. V.
    New search for: Grillenberger, J.
    New search for: Nilsen, O.
    New search for: Fjellvag, H.
    New search for: Svensson, B. G.
    New search for: Nipoti, R.
    New search for: Poggi, A.
    New search for: Scorzoni, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrical Properties of Aluminum Oxide Films Grown by Atomic Layer Deposition on n-Type 4H-SiC

    New search for: Avice, M.
    New search for: Grossner, U.
    New search for: Monakhov, E. V.
    New search for: Grillenberger, J.
    New search for: Nilsen, O.
    New search for: Fjellvag, H.
    New search for: Svensson, B. G.
    New search for: Nipoti, R.
    New search for: Poggi, A.
    New search for: Scorzoni, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Electrical Properties of Aluminum Oxide Films Grown by Atomic Layer Deposition on n-Type 4H-SiC

    Contributors:

    Avice, M. (author) / Grossner, U. (author) / Monakhov, E. V. (author) / Grillenberger, J. (author) / Nilsen, O. (author) / Fjellvag, H. (author) / Svensson, B. G. (author) / Nipoti, R. / Poggi, A. / Scorzoni, A.

    Published in:

    Silicon Carbide and Related Materials 2004 ; 705-708

    MATERIALS SCIENCE FORUM ; 483/485

    Publication date:

    2005-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition

    Luka, G. / Wachnicki, L. / Witkowski, B. S. et al. | British Library Online Contents | 2011

    Electrical and mechanical stability of aluminum-doped ZnO films grown on flexible substrates by atomic layer deposition

    Luka, G. / Witkowski, B. S. / Wachnicki, L. et al. | British Library Online Contents | 2014

    Electrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition

    Park, N. K. / Kang, D. K. / Kim, B. H. et al. | British Library Online Contents | 2006

    Improved efficiency of aluminum doping in ZnO thin films grown by atomic layer deposition

    Park, H. K. / Heo, J. | British Library Online Contents | 2014

    Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition

    Jeong, C. W. / Lee, B. i. / Joo, S. K. | British Library Online Contents | 2001

    Back to top