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The etching properties of Al2O3 thin films in N2/Cl2/BCl3 and Ar/Cl2/BCl3 gas chemistry
The etching properties of Al2O3 thin films in N2/Cl2/BCl3 and Ar/Cl2/BCl3 gas chemistry
The etching properties of Al2O3 thin films in N2/Cl2/BCl3 and Ar/Cl2/BCl3 gas chemistry
Koo, S. M. (author) / Kim, D. P. (author) / Kim, K. T. (author) / Kim, C. I. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 118 ; 201-204
2005-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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