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    Injection of point defects during annealing of low energy As implanted silicon

    New search for: Tsamis, C.
    New search for: Skarlatos, D.
    New search for: Valamontes, V.
    New search for: Tsoukalas, D.
    New search for: BenAssayag, G.
    New search for: Claverie, A.
    New search for: Lerch, W.

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    Injection of point defects during annealing of low energy As implanted silicon

    New search for: Tsamis, C.
    New search for: Skarlatos, D.
    New search for: Valamontes, V.
    New search for: Tsoukalas, D.
    New search for: BenAssayag, G.
    New search for: Claverie, A.
    New search for: Lerch, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Injection of point defects during annealing of low energy As implanted silicon

    New search for: Tsamis, C.
    New search for: Skarlatos, D.
    New search for: Valamontes, V.
    New search for: Tsoukalas, D.
    New search for: BenAssayag, G.
    New search for: Claverie, A.
    New search for: Lerch, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Injection of point defects during annealing of low energy As implanted silicon

    Contributors:

    Tsamis, C. (author) / Skarlatos, D. (author) / Valamontes, V. (author) / Tsoukalas, D. (author) / BenAssayag, G. (author) / Claverie, A. (author) / Lerch, W. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 261-265

    Publication date:

    2005-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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