A platform for research: civil engineering, architecture and urbanism
High Epitaxial Growth Rate of 4H-SiC Using Horizontal Hot-Wall CVD
High Epitaxial Growth Rate of 4H-SiC Using Horizontal Hot-Wall CVD
High Epitaxial Growth Rate of 4H-SiC Using Horizontal Hot-Wall CVD
Myers, R. L. (author) / Shishkin, Y. (author) / Kordina, O. (author) / Haselbarth, I. (author) / Saddow, S. E. (author) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
2006-01-01
4 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Uniformity Improvement in SiC Epitaxial Growth by Horizontal Hot-Wall CVD
British Library Online Contents | 2003
|High-Rate Epitaxial Growth of 4H-SiC Using a Vertical-Type, Quasi-Hot-Wall CVD Reactor
British Library Online Contents | 2002
|High Growth Rate (up to 20 mum/h) SiC Epitaxy in a Horizontal Hot-Wall Reactor
British Library Online Contents | 2005
|Epitaxial Growth of 4H-SiC (0001) by Sublimation Method Using Horizontal Furnace
British Library Online Contents | 2006
|Epitaxial Deposition of Silicon Carbide Films in a Horizontal Hot-Wall CVD Reactor
British Library Online Contents | 2005
|