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Effect of rapid thermal annealing of sputtered aluminium nitride film in an oxygen ambient
Effect of rapid thermal annealing of sputtered aluminium nitride film in an oxygen ambient
Effect of rapid thermal annealing of sputtered aluminium nitride film in an oxygen ambient
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 1137-1141
2006-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
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