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An experimental study of the reactive ion etching (RIE) of GaP using BCl3 plasma processing
An experimental study of the reactive ion etching (RIE) of GaP using BCl3 plasma processing
An experimental study of the reactive ion etching (RIE) of GaP using BCl3 plasma processing
Yang, S. H. (author) / Bandaru, P. R. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 143 ; 27-30
2007-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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