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    Structural characterization of nc-Si films grown by low-energy PECVD on different substrates

    New search for: Le Donne, A.
    New search for: Binetti, S.
    New search for: Isella, G.
    New search for: Pichaud, B.
    New search for: Texier, M.
    New search for: Acciarri, M.
    New search for: Pizzini, S.

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    Structural characterization of nc-Si films grown by low-energy PECVD on different substrates

    New search for: Le Donne, A.
    New search for: Binetti, S.
    New search for: Isella, G.
    New search for: Pichaud, B.
    New search for: Texier, M.
    New search for: Acciarri, M.
    New search for: Pizzini, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural characterization of nc-Si films grown by low-energy PECVD on different substrates

    New search for: Le Donne, A.
    New search for: Binetti, S.
    New search for: Isella, G.
    New search for: Pichaud, B.
    New search for: Texier, M.
    New search for: Acciarri, M.
    New search for: Pizzini, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Structural characterization of nc-Si films grown by low-energy PECVD on different substrates

    Contributors:

    Le Donne, A. (author) / Binetti, S. (author) / Isella, G. (author) / Pichaud, B. (author) / Texier, M. (author) / Acciarri, M. (author) / Pizzini, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 254 ; 2804-2808

    Publication date:

    2008-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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