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    Effect of film chemistry on refractive index of plasma-enhanced chemical vapor deposited silicon oxynitride films: A correlative study

    New search for: Naskar, S.
    New search for: Wolter, S.D.
    New search for: Bower, C.A.
    New search for: Stoner, B.R.
    New search for: Glass, J.T.

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    Effect of film chemistry on refractive index of plasma-enhanced chemical vapor deposited silicon oxynitride films: A correlative study

    New search for: Naskar, S.
    New search for: Wolter, S.D.
    New search for: Bower, C.A.
    New search for: Stoner, B.R.
    New search for: Glass, J.T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of film chemistry on refractive index of plasma-enhanced chemical vapor deposited silicon oxynitride films: A correlative study

    New search for: Naskar, S.
    New search for: Wolter, S.D.
    New search for: Bower, C.A.
    New search for: Stoner, B.R.
    New search for: Glass, J.T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Effect of film chemistry on refractive index of plasma-enhanced chemical vapor deposited silicon oxynitride films: A correlative study

    Contributors:

    Naskar, S. (author) / Wolter, S.D. (author) / Bower, C.A. (author) / Stoner, B.R. (author) / Glass, J.T. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 23 ; 1433-1442

    Publication date:

    2008-01-01

    Size:

    10 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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