Microtrench of oxynitride thin films in a C2F6 inductively coupled plasma

Kim, B. / Lee, B. T. | British Library Online Contents | 2006

Reactive ion etching of FePt using inductively coupled plasma

Kanazawa, T. / Ono, K. / Takenaka, M. et al. | British Library Online Contents | 2008

High rate etching of sapphire wafer using Cl2/BCl3/Ar inductively coupled plasmas

Sung, Y. J. / Kim, H. S. / Lee, Y. H. et al. | British Library Online Contents | 2001

Study of dry etching for GaN and InGaN-based laser structure using inductively coupled plasma reactive ion etching

Kao, C. C. / Huang, H. W. / Tsai, J. Y. et al. | British Library Online Contents | 2004

Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasmas

Jeong, C. H. / Kim, D. W. / Bae, J. W. et al. | British Library Online Contents | 2002