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Thermal oxidation mechanism and stress evolution in Ta thin films

Jin, Y. / Song, J.Y. / Jeong, S.-H. / Kim, J.W. / Lee, T.G. / Kim, J.H. / Hahn, J.

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Thermal oxidation mechanism and stress evolution in Ta thin films

Jin, Y. / Song, J.Y. / Jeong, S.-H. / Kim, J.W. / Lee, T.G. / Kim, J.H. / Hahn, J.

Thermal oxidation mechanism and stress evolution in Ta thin films

Jin, Y. / Song, J.Y. / Jeong, S.-H. / Kim, J.W. / Lee, T.G. / Kim, J.H. / Hahn, J.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Thermal oxidation mechanism and stress evolution in Ta thin films

Contributors:

Jin, Y. (author) / Song, J.Y. (author) / Jeong, S.-H. (author) / Kim, J.W. (author) / Lee, T.G. (author) / Kim, J.H. (author) / Hahn, J. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 25 ; 1080-1086

Publication date:

2010-01-01

Size:

7 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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