Electrical and structural characterization of PLD grown CeO2-HfO2 laminated high-k gate dielectrics: Fid-Bau Portal

Electrical and structural characterization of PLD grown CeO2-HfO2 laminated high-k gate dielectrics

Karakaya, K. / Barcones, B. / Rittersma, Z. M. / van Berkum, J. G. / Verheijen, M. A. / Rijnders, G. / Blank, D. H.

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Electrical and structural characterization of PLD grown CeO2-HfO2 laminated high-k gate dielectrics

Karakaya, K. / Barcones, B. / Rittersma, Z. M. / van Berkum, J. G. / Verheijen, M. A. / Rijnders, G. / Blank, D. H.

Electrical and structural characterization of PLD grown CeO2-HfO2 laminated high-k gate dielectrics

Karakaya, K. / Barcones, B. / Rittersma, Z. M. / van Berkum, J. G. / Verheijen, M. A. / Rijnders, G. / Blank, D. H.

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Document information

Title:

Electrical and structural characterization of PLD grown CeO2-HfO2 laminated high-k gate dielectrics

Contributors:

Karakaya, K. (author) / Barcones, B. (author) / Rittersma, Z. M. (author) / van Berkum, J. G. (author) / Verheijen, M. A. (author) / Rijnders, G. (author) / Blank, D. H. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 1061-1064

Publication date:

2006-01-01

Size:

4 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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