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A novel atomic force microscopy based lithography system for automated patterning via anodic oxidation

Gan, Y.J. / Wong, H.Y. / Lee, W.P.

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A novel atomic force microscopy based lithography system for automated patterning via anodic oxidation

Gan, Y.J. / Wong, H.Y. / Lee, W.P.

A novel atomic force microscopy based lithography system for automated patterning via anodic oxidation

Gan, Y.J. / Wong, H.Y. / Lee, W.P.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

A novel atomic force microscopy based lithography system for automated patterning via anodic oxidation

Contributors:

Gan, Y.J. (author) / Wong, H.Y. (author) / Lee, W.P. (author)

Published in:

COMPOSITES PART B ; 42 ; 456-461

Publication date:

2011-01-01

Size:

6 pages

ISSN:

1359-8368

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.118

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