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Metal-assisted homogeneous etching of single crystal silicon: A novel approach to obtain an ultra-thin silicon wafer
Metal-assisted homogeneous etching of single crystal silicon: A novel approach to obtain an ultra-thin silicon wafer
Metal-assisted homogeneous etching of single crystal silicon: A novel approach to obtain an ultra-thin silicon wafer
Bai, Fan (author) / Li, Meicheng (author) / Song, Dandan (author) / Yu, Hang (author) / Jiang, Bing (author) / Li, Yingfeng (author)
Applied surface science ; 273 ; 107-110
2013-01-01
4 pages
Article (Journal)
English
DDC:
620.44
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