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Metal-assisted homogeneous etching of single crystal silicon: A novel approach to obtain an ultra-thin silicon wafer

Bai, F. / Li, M. / Song, D. / Yu, H. / Jiang, B. / Li, Y.

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Metal-assisted homogeneous etching of single crystal silicon: A novel approach to obtain an ultra-thin silicon wafer

Bai, F. / Li, M. / Song, D. / Yu, H. / Jiang, B. / Li, Y.

Metal-assisted homogeneous etching of single crystal silicon: A novel approach to obtain an ultra-thin silicon wafer

Bai, F. / Li, M. / Song, D. / Yu, H. / Jiang, B. / Li, Y.

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Check availability in my library

Order at Subito €

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Document information

Title:

Metal-assisted homogeneous etching of single crystal silicon: A novel approach to obtain an ultra-thin silicon wafer

Contributors:

Bai, F. (author) / Li, M. (author) / Song, D. (author) / Yu, H. (author) / Jiang, B. (author) / Li, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 273 ; 107-110

Publication date:

2013-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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