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Phase transition in sputtered HfO2 thin films: A qualitative Raman study

Belo, G. S. / Nakagomi, F. / Minko, A. / da Silva, S. W. / Morais, P. C. / Buchanan, D. A.

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Phase transition in sputtered HfO2 thin films: A qualitative Raman study

Belo, G. S. / Nakagomi, F. / Minko, A. / da Silva, S. W. / Morais, P. C. / Buchanan, D. A.

Phase transition in sputtered HfO2 thin films: A qualitative Raman study

Belo, G. S. / Nakagomi, F. / Minko, A. / da Silva, S. W. / Morais, P. C. / Buchanan, D. A.

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Document information

Title:

Phase transition in sputtered HfO2 thin films: A qualitative Raman study

Contributors:

Belo, G. S. (author) / Nakagomi, F. (author) / Minko, A. (author) / da Silva, S. W. (author) / Morais, P. C. (author) / Buchanan, D. A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 261 ; 727-729

Publication date:

2012-01-01

Size:

3 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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