Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition: Fid-Bau Portal

Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition

Nam, T. / Lee, C. W. / Kim, H. J. / Kim, H.

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Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition

Nam, T. / Lee, C. W. / Kim, H. J. / Kim, H.

Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition

Nam, T. / Lee, C. W. / Kim, H. J. / Kim, H.

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Order at Subito €

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Document information

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Document information

Title:

Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition

Contributors:

Nam, T. (author) / Lee, C. W. (author) / Kim, H. J. (author) / Kim, H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 295 ; 260-265

Publication date:

2014-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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