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Influence of mold and substrate material combinations on nanoimprint lithography process: MD simulation approach

Yang, S. / Yu, S. / Cho, M.

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Influence of mold and substrate material combinations on nanoimprint lithography process: MD simulation approach

Yang, S. / Yu, S. / Cho, M.

Influence of mold and substrate material combinations on nanoimprint lithography process: MD simulation approach

Yang, S. / Yu, S. / Cho, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of mold and substrate material combinations on nanoimprint lithography process: MD simulation approach

Contributors:

Yang, S. (author) / Yu, S. (author) / Cho, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 301 ; 189-198

Publication date:

2014-01-01

Size:

10 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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