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Study of the La-related dipole in TiN/LaOx/HfSiON/SiON/Si gate stacks using hard X-ray photoelectron spectroscopy and backside medium energy ion scattering
Study of the La-related dipole in TiN/LaOx/HfSiON/SiON/Si gate stacks using hard X-ray photoelectron spectroscopy and backside medium energy ion scattering
Study of the La-related dipole in TiN/LaOx/HfSiON/SiON/Si gate stacks using hard X-ray photoelectron spectroscopy and backside medium energy ion scattering
Boujamaa, R. (author) / Martinez, E. (author) / Pierre, F. (author) / Renault, O. (author) / Detlefs, B. (author) / Zegenhagen, J. (author) / Baudot, S. (author) / Gros-Jean, M. (author) / Bertin, F. (author) / Dubourdieu, C. (author)
APPLIED SURFACE SCIENCE ; 335 ; 71-77
2015-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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