Leakage current characteristics of metal (Ag,TiN,W)-Hf:Ta2O5/SiOxNy

Leakage current characteristics of metal (Ag,TiN,W)-Hf:Ta2O5/SiOxNy–Si structures

Novkovski, N. / Atanassova, E.

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Leakage current characteristics of metal (Ag,TiN,W)-Hf:Ta2O5/SiOxNy–Si structures

Novkovski, N. / Atanassova, E.

Leakage current characteristics of metal (Ag,TiN,W)-Hf:Ta2O5/SiOxNy–Si structures

Novkovski, N. / Atanassova, E.

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Order at Subito €

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Document information

Title:

Leakage current characteristics of metal (Ag,TiN,W)-Hf:Ta2O5/SiOxNy–Si structures

Contributors:

Novkovski, N. (author) / Atanassova, E. (author)

Published in:

Materials science in semiconductor processing ; 29 ; 345-350

Publication date:

2015-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

van Berkum, J. G. / Hopstaken, M. J. / Snijders, J. H. et al. | British Library Online Contents | 2003

Determination of interface states in metal(Ag,TiN,W)−Hf:Ta2O5/SiOxNy−Si structures by different compact methods

Novkovski, N. | British Library Online Contents | 2015

Formation of silicon on plasma synthesized SiOxNy and reaction mechanism

Zhu, M. / Shi, X. / Chen, P. et al. | British Library Online Contents | 2005

SIMS and high-resolution RBS analysis of ultrathin SiOxNy films

Kimura, K. / Nakajima, K. / Kobayashi, H. et al. | British Library Online Contents | 2003

SiOxNy thin films with variable refraction index: Microstructural, chemical and mechanical properties

Godinho, V. / Haro, M. C. / Garcia-Lopez, J. et al. | British Library Online Contents | 2010