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Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
Shi, Fengfeng (author) / Han, Jun (author) / Xing, Yanhui (author) / Li, Junshuai (author) / Zhang, Li (author) / He, Tao (author) / Li, Tao (author) / Deng, Xuguang (author) / Zhang, Xiaodong (author) / Zhang, Baoshun (author)
MATERIALS LETTERS ; 237 ; 105-108
2019-01-01
4 pages
Article (Journal)
Unknown
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