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Transparent oxide film, method for producing transparent oxide film, oxide sintered compact and transparent resin substrate
Provided are: a transparent oxide film that has high transparency, good water vapor barrier performance, excellent chemical resistance and high flexibility; a method for producing the transparent oxide film by direct current sputtering with high mass productivity; an oxide sintered compact for forming a film; and a transparent resin substrate using the transparent oxide film. An amorphous transparent oxide film containing Zn and Sn, wherein the metal atom ratio Sn/(Zn+Sn) is 0.44-0.90 inclusive, and the film thickness is not more than 100 nm. A method for producing a transparent oxide film bysputtering with the use of a target comprising an Sn-Zn-O-based oxide sintered compact, wherein: in the oxide sintered compact containing Zn and Sn to be used in the sputtering, the metal atom ratio Sn/(Zn+Sn) is 0.44-0.90 inclusive; and the thickness of the film formed thereby is not more than 100 nm.
本发明提供一种通过量产性高的直流溅射而具有良好的透明性、水蒸气阻隔性能、以及优异的耐化学试剂性，并且柔性也优异的透明氧化物膜及其制造方法、用于形成膜的氧化物烧结体、以及使用透明氧化物膜的透明树脂基板。一种含有Zn和Sn的非晶质的透明氧化物膜，以金属原子数比计，Sn/(Zn+Sn)为0.44以上且0.90以下，膜厚为100nm以下。另外，一种透明氧化物膜的制造方法，使用由Sn‑Zn‑O系的氧化物烧结体构成的靶进行溅射而得到透明氧化物膜，溅射时所使用的所述氧化物烧结体中含有的Zn与Sn的金属原子数比的Sn/(Zn+Sn)为0.44以上且0.90以下，成膜的膜厚为100nm以下。
Transparent oxide film, method for producing transparent oxide film, oxide sintered compact and transparent resin substrate
Provided are: a transparent oxide film that has high transparency, good water vapor barrier performance, excellent chemical resistance and high flexibility; a method for producing the transparent oxide film by direct current sputtering with high mass productivity; an oxide sintered compact for forming a film; and a transparent resin substrate using the transparent oxide film. An amorphous transparent oxide film containing Zn and Sn, wherein the metal atom ratio Sn/(Zn+Sn) is 0.44-0.90 inclusive, and the film thickness is not more than 100 nm. A method for producing a transparent oxide film bysputtering with the use of a target comprising an Sn-Zn-O-based oxide sintered compact, wherein: in the oxide sintered compact containing Zn and Sn to be used in the sputtering, the metal atom ratio Sn/(Zn+Sn) is 0.44-0.90 inclusive; and the thickness of the film formed thereby is not more than 100 nm.
本发明提供一种通过量产性高的直流溅射而具有良好的透明性、水蒸气阻隔性能、以及优异的耐化学试剂性，并且柔性也优异的透明氧化物膜及其制造方法、用于形成膜的氧化物烧结体、以及使用透明氧化物膜的透明树脂基板。一种含有Zn和Sn的非晶质的透明氧化物膜，以金属原子数比计，Sn/(Zn+Sn)为0.44以上且0.90以下，膜厚为100nm以下。另外，一种透明氧化物膜的制造方法，使用由Sn‑Zn‑O系的氧化物烧结体构成的靶进行溅射而得到透明氧化物膜，溅射时所使用的所述氧化物烧结体中含有的Zn与Sn的金属原子数比的Sn/(Zn+Sn)为0.44以上且0.90以下，成膜的膜厚为100nm以下。
Transparent oxide film, method for producing transparent oxide film, oxide sintered compact and transparent resin substrate
透明氧化物膜、透明氧化物膜的制造方法、氧化物烧结体和透明树脂基板
SHIMOYAMADA TAKUYA (author) / KUWAHARA MASAKAZU (author) / NITO SHIGEO (author)
2020-10-27
Patent
Electronic Resource
Chinese
| European Patent Office | 2019
| European Patent Office | 2019
| European Patent Office | 2019
| European Patent Office | 2020
| European Patent Office | 2020