A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
TRANSPARENT OXIDE FILM, METHOD OF MANUFACTURING TRANSPARENT OXIDE FILM, OXIDE SINTERED BODY AND TRANSPARENT RESIN SUBSTRATE
To provide a transparent oxide film excellent in transparency, water vapor barrier performance, chemical resistance, and flexibility made available using high volume-producibility DC sputtering, and also to provide a method of manufacturing the transparent oxide film, an oxide sintered body for making the film, and a transparent resin substrate using the transparent oxide film.SOLUTION: The amorphous transparent oxide film containing Zn and Sn is provided that has a number-of-metal-atoms ratio Sn/(Zn+Sn) of the amorphous transparent oxide file of 0.44 or more and 0.90 or less, and a film thickness of 100 nm or less. The method of manufacturing the transparent oxide film is provided that uses a target made of Sn-Zn-O-based oxide sintered body to perform sputtering, wherein the number-of-metal-atoms ratio Sn/(Zn+Sn) of Zn and Sn contained in the oxide sintered body used upon sputtering is 0.44 or more and 0.90 or less and the thickness of a file to be formed is 100 nm or less.SELECTED DRAWING: None
【課題】量産性の高い直流スパッタリングにて、良好な透明性、水蒸気バリア性能、そして優れた耐薬品性を有し、フレキシブル性にも優れた透明酸化物膜とその製造方法、膜を成膜するための酸化物焼結体、そして明酸化物膜を用いた透明樹脂基板を提供する。【解決手段】ＺｎとＳｎとを含有する非晶質の透明酸化物膜であって、金属原子数比で、Ｓｎ／（Ｚｎ＋Ｓｎ）が０．４４以上０．９０以下であり、膜厚が１００ｎｍ以下である。また、Ｓｎ−Ｚｎ−Ｏ系の酸化物焼結体からなるターゲットを用いてスパッタリングし、透明酸化物膜を得る透明酸化物膜の製造方法であって、スパッタリング時に用いられる前記酸化物焼結体に含有するＺｎとＳｎの金属原子数比のＳｎ／（Ｚｎ＋Ｓｎ）が０．４４以上０．９０以下であり、成膜する膜厚が１００ｎｍ以下である。【選択図】なし
TRANSPARENT OXIDE FILM, METHOD OF MANUFACTURING TRANSPARENT OXIDE FILM, OXIDE SINTERED BODY AND TRANSPARENT RESIN SUBSTRATE
To provide a transparent oxide film excellent in transparency, water vapor barrier performance, chemical resistance, and flexibility made available using high volume-producibility DC sputtering, and also to provide a method of manufacturing the transparent oxide film, an oxide sintered body for making the film, and a transparent resin substrate using the transparent oxide film.SOLUTION: The amorphous transparent oxide film containing Zn and Sn is provided that has a number-of-metal-atoms ratio Sn/(Zn+Sn) of the amorphous transparent oxide file of 0.44 or more and 0.90 or less, and a film thickness of 100 nm or less. The method of manufacturing the transparent oxide film is provided that uses a target made of Sn-Zn-O-based oxide sintered body to perform sputtering, wherein the number-of-metal-atoms ratio Sn/(Zn+Sn) of Zn and Sn contained in the oxide sintered body used upon sputtering is 0.44 or more and 0.90 or less and the thickness of a file to be formed is 100 nm or less.SELECTED DRAWING: None
【課題】量産性の高い直流スパッタリングにて、良好な透明性、水蒸気バリア性能、そして優れた耐薬品性を有し、フレキシブル性にも優れた透明酸化物膜とその製造方法、膜を成膜するための酸化物焼結体、そして明酸化物膜を用いた透明樹脂基板を提供する。【解決手段】ＺｎとＳｎとを含有する非晶質の透明酸化物膜であって、金属原子数比で、Ｓｎ／（Ｚｎ＋Ｓｎ）が０．４４以上０．９０以下であり、膜厚が１００ｎｍ以下である。また、Ｓｎ−Ｚｎ−Ｏ系の酸化物焼結体からなるターゲットを用いてスパッタリングし、透明酸化物膜を得る透明酸化物膜の製造方法であって、スパッタリング時に用いられる前記酸化物焼結体に含有するＺｎとＳｎの金属原子数比のＳｎ／（Ｚｎ＋Ｓｎ）が０．４４以上０．９０以下であり、成膜する膜厚が１００ｎｍ以下である。【選択図】なし
TRANSPARENT OXIDE FILM, METHOD OF MANUFACTURING TRANSPARENT OXIDE FILM, OXIDE SINTERED BODY AND TRANSPARENT RESIN SUBSTRATE
透明酸化物膜、透明酸化物膜の製造方法、酸化物焼結体及び透明樹脂基板
SHIMOYAMADA TAKUYA (author) / KUWAHARA MASAKAZU (author) / NITO SHIGEO (author)
2019-09-26
Patent
Electronic Resource
Japanese
| European Patent Office | 2019
| European Patent Office | 2020
| European Patent Office | 2019
| European Patent Office | 2019
| European Patent Office | 2019