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A platform for research: civil engineering, architecture and urbanism
TRANSPARENT OXIDE-LAMINATED FILM, METHOD FOR PRODUCING TRANSPARENT OXIDE-LAMINATED FILM, AND TRANSPARENT RESIN SUBSTRATE
Provided are: a transparent oxide-laminated film having excellent transparency, good moisture barrier performance, and chemical resistance; a method for producing the transparent oxide-laminated film;and a transparent resin substrate using the transparent oxide-laminated film. The transparent oxide-laminated film is obtained by laminating a plurality of layers of a transparent oxide film containing Zn and Sn, wherein each of the layers is composed of an amorphous transparent oxide film having a different atomic ratio of Zn to Sn. The method for producing the transparent oxide-laminated film uses sputtering targets made of different Sn-Zn-O-based oxide sintered bodies, wherein a first target having an oxide sintered body having an atomic ratio Sn/(Zn+Sn) of 0.18-0.29, and a second target having an oxide sintered body having an atomic ratio Sn/(Zn+Sn) of 0.44-0.90 are used to form the transparent oxide laminated-film.
本发明提供一种具有优异的透明性、良好的水蒸气阻隔性能、以及耐化学试剂性的透明氧化物层叠膜及其制造方法、以及使用该透明氧化物层叠膜的透明树脂基板。一种透明氧化物层叠膜，将多层含有Zn和Sn的透明氧化物膜层叠而成，所述透明氧化物层叠膜由各层中Zn与Sn的金属原子数比不同的非晶质透明氧化物膜构成。此外，一种透明氧化物层叠膜的制造方法，使用由Sn‑Zn‑O系氧化物烧结体构成的靶进行溅射，至少使用第1靶和第2靶来形成透明氧化物层叠膜，所述第1靶具有以金属原子数比计Sn/(Zn+Sn)为0.18以上0.29以下的氧化物烧结体，所述第2靶具有以金属原子数比计Sn/(Zn+Sn)为0.44以上0.90以下的氧化物烧结体。
TRANSPARENT OXIDE-LAMINATED FILM, METHOD FOR PRODUCING TRANSPARENT OXIDE-LAMINATED FILM, AND TRANSPARENT RESIN SUBSTRATE
Provided are: a transparent oxide-laminated film having excellent transparency, good moisture barrier performance, and chemical resistance; a method for producing the transparent oxide-laminated film;and a transparent resin substrate using the transparent oxide-laminated film. The transparent oxide-laminated film is obtained by laminating a plurality of layers of a transparent oxide film containing Zn and Sn, wherein each of the layers is composed of an amorphous transparent oxide film having a different atomic ratio of Zn to Sn. The method for producing the transparent oxide-laminated film uses sputtering targets made of different Sn-Zn-O-based oxide sintered bodies, wherein a first target having an oxide sintered body having an atomic ratio Sn/(Zn+Sn) of 0.18-0.29, and a second target having an oxide sintered body having an atomic ratio Sn/(Zn+Sn) of 0.44-0.90 are used to form the transparent oxide laminated-film.
本发明提供一种具有优异的透明性、良好的水蒸气阻隔性能、以及耐化学试剂性的透明氧化物层叠膜及其制造方法、以及使用该透明氧化物层叠膜的透明树脂基板。一种透明氧化物层叠膜，将多层含有Zn和Sn的透明氧化物膜层叠而成，所述透明氧化物层叠膜由各层中Zn与Sn的金属原子数比不同的非晶质透明氧化物膜构成。此外，一种透明氧化物层叠膜的制造方法，使用由Sn‑Zn‑O系氧化物烧结体构成的靶进行溅射，至少使用第1靶和第2靶来形成透明氧化物层叠膜，所述第1靶具有以金属原子数比计Sn/(Zn+Sn)为0.18以上0.29以下的氧化物烧结体，所述第2靶具有以金属原子数比计Sn/(Zn+Sn)为0.44以上0.90以下的氧化物烧结体。
TRANSPARENT OXIDE-LAMINATED FILM, METHOD FOR PRODUCING TRANSPARENT OXIDE-LAMINATED FILM, AND TRANSPARENT RESIN SUBSTRATE
透明氧化物层叠膜、透明氧化物层叠膜的制造方法和透明树脂基板
KUWAHARA MASAKAZU (author) / NITO SHIGEO (author)
2020-10-30
Patent
Electronic Resource
Chinese
IPC:
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
/
B32B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
,
Schichtkörper, d.h. aus Ebenen oder gewölbten Schichten, z.B. mit zell- oder wabenförmiger Form, aufgebaute Erzeugnisse
/
C04B
Kalk
,
LIME
| European Patent Office | 2019
| European Patent Office | 2019
| European Patent Office | 2019
| European Patent Office | 2020
| European Patent Office | 2019