A platform for research: civil engineering, architecture and urbanism
TRANSPARENT OXIDE-LAMINATED FILM, METHOD OF MANUFACTURING TRANSPARENT OXIDE-LAMINATED FILM, AND TRANSPARENT RESIN SUBSTRATE
To provide a transparent oxide-laminated film having excellent transparency, favorable water vapor barrier performance, and chemical resistance, and a method of manufacturing the transparent oxide-laminated film, and a transparent resin substrate using the transparent oxide-laminated film.SOLUTION: The transparent oxide-laminated film is provided that is formed by laminating a plurality of transparent oxide films containing Zn and Sn, each layer being an amorphous transparent oxide film different in a number-of-metal-atoms ratio of Zn to Sn. The method of manufacturing the transparent oxide-laminated film is provided that uses a target made of Sn-Zn-O-based oxide sintered body to perform sputtering, by which method, at least a first target having an oxide sintered object with the number-of-metal-atoms ratio of Sn/(Zn+Sn) being 0.18 or more and 0.29 or less and a second target having an oxide sintered object with the number-of-metal-atoms ratio of Sn/(Zn+Sn) being 0.44 or more and 0.90 or less are used to form the transparent oxide laminated-film.SELECTED DRAWING: None
【課題】優れた透明性、良好な水蒸気バリア性能、そして耐薬品性有する、透明酸化物積層膜とその製造方法、そしてこれを用いた透明樹脂基板を提供する。【解決手段】ZnとSnとを含有する透明酸化物膜を複数層積層した透明酸化物積層膜であって、各層でZnとSnの金属原子数比が異なる非晶質の透明酸化物膜から構成される。また、Sn−Zn−O系の酸化物焼結体からなるターゲットを用いてスパッタリングする透明酸化物積層膜の製造方法であって、少なくとも、金属原子数比で、Sn/(Zn+Sn)が0.18以上0.29以下である酸化物焼結体を有する第1のターゲットと、金属原子数比で、Sn/(Zn+Sn)が0.44以上0.90以下である酸化物焼結体を有する第2のターゲットとを用いて透明酸化物積層膜を形成する【選択図】なし
TRANSPARENT OXIDE-LAMINATED FILM, METHOD OF MANUFACTURING TRANSPARENT OXIDE-LAMINATED FILM, AND TRANSPARENT RESIN SUBSTRATE
To provide a transparent oxide-laminated film having excellent transparency, favorable water vapor barrier performance, and chemical resistance, and a method of manufacturing the transparent oxide-laminated film, and a transparent resin substrate using the transparent oxide-laminated film.SOLUTION: The transparent oxide-laminated film is provided that is formed by laminating a plurality of transparent oxide films containing Zn and Sn, each layer being an amorphous transparent oxide film different in a number-of-metal-atoms ratio of Zn to Sn. The method of manufacturing the transparent oxide-laminated film is provided that uses a target made of Sn-Zn-O-based oxide sintered body to perform sputtering, by which method, at least a first target having an oxide sintered object with the number-of-metal-atoms ratio of Sn/(Zn+Sn) being 0.18 or more and 0.29 or less and a second target having an oxide sintered object with the number-of-metal-atoms ratio of Sn/(Zn+Sn) being 0.44 or more and 0.90 or less are used to form the transparent oxide laminated-film.SELECTED DRAWING: None
【課題】優れた透明性、良好な水蒸気バリア性能、そして耐薬品性有する、透明酸化物積層膜とその製造方法、そしてこれを用いた透明樹脂基板を提供する。【解決手段】ZnとSnとを含有する透明酸化物膜を複数層積層した透明酸化物積層膜であって、各層でZnとSnの金属原子数比が異なる非晶質の透明酸化物膜から構成される。また、Sn−Zn−O系の酸化物焼結体からなるターゲットを用いてスパッタリングする透明酸化物積層膜の製造方法であって、少なくとも、金属原子数比で、Sn/(Zn+Sn)が0.18以上0.29以下である酸化物焼結体を有する第1のターゲットと、金属原子数比で、Sn/(Zn+Sn)が0.44以上0.90以下である酸化物焼結体を有する第2のターゲットとを用いて透明酸化物積層膜を形成する【選択図】なし
TRANSPARENT OXIDE-LAMINATED FILM, METHOD OF MANUFACTURING TRANSPARENT OXIDE-LAMINATED FILM, AND TRANSPARENT RESIN SUBSTRATE
透明酸化物積層膜、透明酸化物積層膜の製造方法、及び透明樹脂基板
KUWAHARA MASAKAZU (author) / NITO SHIGEO (author)
2019-09-26
Patent
Electronic Resource
Japanese
IPC:
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
/
B32B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
,
Schichtkörper, d.h. aus Ebenen oder gewölbten Schichten, z.B. mit zell- oder wabenförmiger Form, aufgebaute Erzeugnisse
/
C04B
Kalk
,
LIME
European Patent Office | 2019
|European Patent Office | 2020
|European Patent Office | 2019
|European Patent Office | 2019
|European Patent Office | 2020
|