Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    MGO SINTERED BODY SPUTTERING TARGET

    New search for: SHIBUYA YOSHITAKA
    New search for: NARITA SATOYASU
    New search for: KAJITA HIROKI

    A MgO sintered sputtering target, wherein a ratio of GOS (Grain Orientation Spread) being 0° to 1° is 75% or higher. A MgO sintered sputtering target, wherein a ratio of KAM (Kernel Average Misorientation) being 0° to 2° is 90% or higher. An object of the present invention is to provide a MgO sintered sputtering target capable of reducing particles.

    Access

    Download

    Access

    Download

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    MGO SINTERED BODY SPUTTERING TARGET

    New search for: SHIBUYA YOSHITAKA
    New search for: NARITA SATOYASU
    New search for: KAJITA HIROKI

    A MgO sintered sputtering target, wherein a ratio of GOS (Grain Orientation Spread) being 0° to 1° is 75% or higher. A MgO sintered sputtering target, wherein a ratio of KAM (Kernel Average Misorientation) being 0° to 2° is 90% or higher. An object of the present invention is to provide a MgO sintered sputtering target capable of reducing particles.

    Access

    Download

    MGO SINTERED BODY SPUTTERING TARGET

    New search for: SHIBUYA YOSHITAKA
    New search for: NARITA SATOYASU
    New search for: KAJITA HIROKI

    A MgO sintered sputtering target, wherein a ratio of GOS (Grain Orientation Spread) being 0° to 1° is 75% or higher. A MgO sintered sputtering target, wherein a ratio of KAM (Kernel Average Misorientation) being 0° to 2° is 90% or higher. An object of the present invention is to provide a MgO sintered sputtering target capable of reducing particles.

    Access

    Download

    Access

    Download

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    MGO SINTERED BODY SPUTTERING TARGET

    Additional title:

    MGO-SINTERKÖRPER-SPUTTERTARGET
    CIBLE DE PULVÉRISATION CATHODIQUE DE TYPE CORPS FRITTÉ EN MGO

    Contributors:

    SHIBUYA YOSHITAKA (author) / NARITA SATOYASU (author) / KAJITA HIROKI (author)

    Publication date:

    2023-04-26

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    English

    Classification:

    IPC:  C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / C04B Kalk , LIME / G11B Informationsspeicherung mit Relativbewegung zwischen Aufzeichnungsträger und Wandler , INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER

    Similar titles

    MGO SINTERED BODY SPUTTERING TARGET

    SHIBUYA YOSHITAKA / NARITA SATOYASU / KAJITA HIROKI | European Patent Office | 2020

    Free access

    SINTERED BODY, SPUTTERING TARGET, AND MANUFACTURING METHOD OF SINTERED BODY

    HIDESHIMA MASAAKI / TSUNODA KOJI | European Patent Office | 2020

    Free access

    OXIDE SINTERED BODY AND SPUTTERING TARGET COMPRISING OXIDE SINTERED BODY

    YAMAGUCHI YOHEI / KURIHARA TOSHIYA / KAKUTA KOJI | European Patent Office | 2016

    Free access

    OXIDE SINTERED BODY AND SPUTTERING TARGET

    UTSUNO FUTOSHI / TERAI KOTA | European Patent Office | 2015

    Free access

    Oxide sintered body and sputtering target

    NISHIYAMA KOHEI / TAO YUKI | European Patent Office | 2021

    Free access
    Back to top