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ZnO TARGET MATERIAL AND TRANSPARENT CONDUCTIVE FILM
PROBLEM TO BE SOLVED: To provide a ZnO target material in which a volume resistivity of a deposited transparent conductive film is low and dispersion of a sheet resistance is little, and to provide a transparent conductive film having improved resistance uniformity deposited by using the same.SOLUTION: A ZnO target material contains one or more kinds selected from between Al and In as much as 1 wt% or more and below 5 wt% in the total amount in terms of AlOor InO, and Si as much as 0.005 wt% or more and below 0.05 wt% in terms of SiO. A transparent conductive film is deposited by using such a ZnO target material.
【課題】成膜された透明導電膜の体積抵抗率が低く、シート抵抗のばらつきが少ないＺｎＯターゲット材及びこれを用いて成膜された抵抗均一性が向上した透明導電膜を提供する。【解決手段】Ａｌ及びＩｎから選択された一種以上をＡｌ２Ｏ３又はＩｎ２Ｏ３換算で総量１ｗｔ％以上５ｗｔ％未満、並びにＳｉをＳｉＯ２換算で０．００５ｗｔ％以上０．０５ｗｔ％未満含むことを特徴とするＺｎＯターゲット材である。また、このようなＺｎＯターゲット材を用いて成膜されることを特徴とする透明導電膜である。【選択図】図１
ZnO TARGET MATERIAL AND TRANSPARENT CONDUCTIVE FILM
PROBLEM TO BE SOLVED: To provide a ZnO target material in which a volume resistivity of a deposited transparent conductive film is low and dispersion of a sheet resistance is little, and to provide a transparent conductive film having improved resistance uniformity deposited by using the same.SOLUTION: A ZnO target material contains one or more kinds selected from between Al and In as much as 1 wt% or more and below 5 wt% in the total amount in terms of AlOor InO, and Si as much as 0.005 wt% or more and below 0.05 wt% in terms of SiO. A transparent conductive film is deposited by using such a ZnO target material.
【課題】成膜された透明導電膜の体積抵抗率が低く、シート抵抗のばらつきが少ないＺｎＯターゲット材及びこれを用いて成膜された抵抗均一性が向上した透明導電膜を提供する。【解決手段】Ａｌ及びＩｎから選択された一種以上をＡｌ２Ｏ３又はＩｎ２Ｏ３換算で総量１ｗｔ％以上５ｗｔ％未満、並びにＳｉをＳｉＯ２換算で０．００５ｗｔ％以上０．０５ｗｔ％未満含むことを特徴とするＺｎＯターゲット材である。また、このようなＺｎＯターゲット材を用いて成膜されることを特徴とする透明導電膜である。【選択図】図１
ZnO TARGET MATERIAL AND TRANSPARENT CONDUCTIVE FILM
ＺｎＯターゲット材及び透明導電膜
MITANI ATSUSHI (author) / SAITA MASATO (author) / KUBO HIROAKI (author) / MATSUNAGA TAIZO (author) / TANAKA MAKI (author)
2015-07-02
Patent
Electronic Resource
Japanese
Sputtering target, transparent conductive film and transparent electrode
| European Patent Office | 2015