A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
ZnO TARGET MATERIAL AND TRANSPARENT CONDUCTIVE FILM
PROBLEM TO BE SOLVED: To provide a ZnO target material in which a volume resistivity of a transparent conductive film obtained by deposition is low, and transmittance in a near-infrared region is high, and dispersion of a sheet resistance is little; and to provide a transparent conductive film deposited by using the same.SOLUTION: A ZnO target material contains Al as much as 1 wt% or more and below 5 wt% in terms of AlO, Si as much as 0.005 wt% or more and below 0.05 wt% in terms of SiO, and Mg as much as 0.005 wt% or more and below 0.1 wt% in terms of MgO. A transparent conductive film is deposited by using the ZnO target material.
【課題】成膜によって得られる透明導電膜の体積抵抗率が低く、近赤外領域における透過率が高く、かつシート抵抗のばらつきが小さいＺｎＯターゲット材及びこれを用いて成膜された透明導電膜を提供する。【解決手段】ＡｌをＡｌ２Ｏ３換算で１ｗｔ％以上５ｗｔ％未満、ＳｉをＳｉＯ２換算で０．００５ｗｔ％以上０．０５ｗｔ％未満、及びＭｇをＭｇＯ換算で０．００５ｗｔ％以上０．１ｗｔ％未満含むことを特徴とするＺｎＯターゲット材である。また、このＺｎＯターゲット材を用いて成膜されたことを特徴とする透明導電膜である。【選択図】なし
ZnO TARGET MATERIAL AND TRANSPARENT CONDUCTIVE FILM
PROBLEM TO BE SOLVED: To provide a ZnO target material in which a volume resistivity of a transparent conductive film obtained by deposition is low, and transmittance in a near-infrared region is high, and dispersion of a sheet resistance is little; and to provide a transparent conductive film deposited by using the same.SOLUTION: A ZnO target material contains Al as much as 1 wt% or more and below 5 wt% in terms of AlO, Si as much as 0.005 wt% or more and below 0.05 wt% in terms of SiO, and Mg as much as 0.005 wt% or more and below 0.1 wt% in terms of MgO. A transparent conductive film is deposited by using the ZnO target material.
【課題】成膜によって得られる透明導電膜の体積抵抗率が低く、近赤外領域における透過率が高く、かつシート抵抗のばらつきが小さいＺｎＯターゲット材及びこれを用いて成膜された透明導電膜を提供する。【解決手段】ＡｌをＡｌ２Ｏ３換算で１ｗｔ％以上５ｗｔ％未満、ＳｉをＳｉＯ２換算で０．００５ｗｔ％以上０．０５ｗｔ％未満、及びＭｇをＭｇＯ換算で０．００５ｗｔ％以上０．１ｗｔ％未満含むことを特徴とするＺｎＯターゲット材である。また、このＺｎＯターゲット材を用いて成膜されたことを特徴とする透明導電膜である。【選択図】なし
ZnO TARGET MATERIAL AND TRANSPARENT CONDUCTIVE FILM
ＺｎＯターゲット材及び透明導電膜
MITANI ATSUSHI (author) / SAITA MASATO (author) / KUBO HIROAKI (author) / MATSUNAGA TAIZO (author) / TANAKA MAKI (author) / UENO SHUJI (author) / AJITOMI SHINZO (author) / WATANABE KEITA (author) / NAGANO MITSUYOSHI (author)
2015-07-02
Patent
Electronic Resource
Japanese
Sputtering target, transparent conductive film and transparent electrode
| European Patent Office | 2015