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Manufacturing method of sputtering target and transparent conductive film
The present invention relates to a manufacturing method of sputtering target, which comprises: a complex metal oxide manufacturing step of manufacturing a complex metal oxide by alkali treatment of mixed solutions of indium precursor and titanium precursor; an oxidation step of manufacturing the complex metal oxide by pre-firing a complex metal hydroxide; a grinding and mixing step of putting obtained complex metal oxide powder into a port, wet ball milling and grinding, and adding a binder when grinding; and a metal oxide sintered body manufacturing step of manufacturing a metal oxide sintered body by sintering the pre-fired complex metal oxide. Therefore, a transparent conductive film manufactured by the present invention can have high electric conductivity, high infrared permeability, and improved thermal stability.
인듐 전구체 및 티타늄 전구체 혼합용액을 알칼리 처리하여 제조하는 복합금속 산화물의 제조단계; 상기 복합금속 수산화물을 예비 소성하여 복합금속 산화물을 제조하는 산화단계; 얻어진 복합금속 산화물 분말을 포트에 넣고, 습식 볼밀 및 분쇄하며, 분쇄 시 바인더를 첨가하는 분쇄 및 혼합단계; 및 상기 예비 소성된 복합금속 산화물을 소결하여 금속 산화물 소결체를 제조하는 단계;를 포함하는 스퍼터링 타겟 제조방법에 관한 것으로, 본 발명에 의해 제조된 투명 도전막은 전기전도성이 높으며, 적외선 투과도가 높고, 열안정성이 뛰어난 장점이 있다.
Manufacturing method of sputtering target and transparent conductive film
The present invention relates to a manufacturing method of sputtering target, which comprises: a complex metal oxide manufacturing step of manufacturing a complex metal oxide by alkali treatment of mixed solutions of indium precursor and titanium precursor; an oxidation step of manufacturing the complex metal oxide by pre-firing a complex metal hydroxide; a grinding and mixing step of putting obtained complex metal oxide powder into a port, wet ball milling and grinding, and adding a binder when grinding; and a metal oxide sintered body manufacturing step of manufacturing a metal oxide sintered body by sintering the pre-fired complex metal oxide. Therefore, a transparent conductive film manufactured by the present invention can have high electric conductivity, high infrared permeability, and improved thermal stability.
인듐 전구체 및 티타늄 전구체 혼합용액을 알칼리 처리하여 제조하는 복합금속 산화물의 제조단계; 상기 복합금속 수산화물을 예비 소성하여 복합금속 산화물을 제조하는 산화단계; 얻어진 복합금속 산화물 분말을 포트에 넣고, 습식 볼밀 및 분쇄하며, 분쇄 시 바인더를 첨가하는 분쇄 및 혼합단계; 및 상기 예비 소성된 복합금속 산화물을 소결하여 금속 산화물 소결체를 제조하는 단계;를 포함하는 스퍼터링 타겟 제조방법에 관한 것으로, 본 발명에 의해 제조된 투명 도전막은 전기전도성이 높으며, 적외선 투과도가 높고, 열안정성이 뛰어난 장점이 있다.
Manufacturing method of sputtering target and transparent conductive film
스퍼터링 타겟 및 투명 도전막의 제조방법
KIM SANG HERN (author)
2018-05-04
Patent
Electronic Resource
Korean
Sputtering target, transparent conductive film and transparent electrode
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