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Secondary Defects and Deep Levels in N-Si Induced By High Energy P Ion Implantation
Secondary Defects and Deep Levels in N-Si Induced By High Energy P Ion Implantation
Secondary Defects and Deep Levels in N-Si Induced By High Energy P Ion Implantation
Tatsukawa, S. (Autor:in) / Nakahara, Y. (Autor:in) / Matsumoto, S. (Autor:in)
MATERIALS SCIENCE FORUM ; 1875-1880
01.01.1995
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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