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Subthreshold characteristics of laterally gated AlGaAs/InGaAs pseudomorphic high-electron-mobility transistors fabricated with focused ion beam implantation
Subthreshold characteristics of laterally gated AlGaAs/InGaAs pseudomorphic high-electron-mobility transistors fabricated with focused ion beam implantation
Subthreshold characteristics of laterally gated AlGaAs/InGaAs pseudomorphic high-electron-mobility transistors fabricated with focused ion beam implantation
Tseng, W.F. (Autor:in) / Monk, D.H. (Autor:in)
MATERIALS LETTERS ; 40 ; 235-239
01.01.1999
5 pages
Aufsatz (Zeitschrift)
Englisch
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