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Low temperature Si epitaxy in a vertical LPCVD batch reactor
Low temperature Si epitaxy in a vertical LPCVD batch reactor
Low temperature Si epitaxy in a vertical LPCVD batch reactor
Ritter, G. (Autor:in) / Harrington, J. (Autor:in) / Tillack, B. (Autor:in) / Morgenstern, T. (Autor:in) / Dietze, G. R. (Autor:in) / Radzimski, Z. J. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 73 ; 203 - 207
01.01.2000
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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