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SiCN thin film prepared at room temperature by r.f. reactive sputtering
SiCN thin film prepared at room temperature by r.f. reactive sputtering
SiCN thin film prepared at room temperature by r.f. reactive sputtering
Wu, X. C. (Autor:in) / Cai, R. Q. (Autor:in) / Yan, P. X. (Autor:in) / Liu, W. M. (Autor:in) / Tian, J. (Autor:in)
APPLIED SURFACE SCIENCE ; 185 ; 262-266
01.01.2002
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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