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    Analysis of high-k HfO~2 and HfSiO~4 dielectric films

    New search for: Nieveen, W.
    New search for: Schueler, B. W.
    New search for: Goodman, G.
    New search for: Schnabel, P.
    New search for: Moskito, J.
    New search for: Mowat, I.
    New search for: Chao, G.

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    Analysis of high-k HfO~2 and HfSiO~4 dielectric films

    New search for: Nieveen, W.
    New search for: Schueler, B. W.
    New search for: Goodman, G.
    New search for: Schnabel, P.
    New search for: Moskito, J.
    New search for: Mowat, I.
    New search for: Chao, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Analysis of high-k HfO~2 and HfSiO~4 dielectric films

    New search for: Nieveen, W.
    New search for: Schueler, B. W.
    New search for: Goodman, G.
    New search for: Schnabel, P.
    New search for: Moskito, J.
    New search for: Mowat, I.
    New search for: Chao, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Analysis of high-k HfO~2 and HfSiO~4 dielectric films

    Contributors:

    Nieveen, W. (author) / Schueler, B. W. (author) / Goodman, G. (author) / Schnabel, P. (author) / Moskito, J. (author) / Mowat, I. (author) / Chao, G. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 231/232 ; 556-560

    Publication date:

    2004-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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