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Superior thermal stability of Ta/TaN bi-layer structure for copper metallization
Superior thermal stability of Ta/TaN bi-layer structure for copper metallization
Superior thermal stability of Ta/TaN bi-layer structure for copper metallization
Xie, Q. (Autor:in) / Qu, X. P. (Autor:in) / Tan, J. J. (Autor:in) / Jiang, Y. L. (Autor:in) / Zhou, M. (Autor:in) / Chen, T. (Autor:in) / Ru, G. P. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 1666-1672
01.01.2006
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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