Modeling of boron diffusion in polysilicon-on-silicon structures using a rapid thermal anneal step for ultra-shallow junction formation: Fid-Bau Portal

Modeling of boron diffusion in polysilicon-on-silicon structures using a rapid thermal anneal step for ultra-shallow junction formation

Sultan, A. / Batra, S. / Lux, G. E. / Banerjee, S.

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Modeling of boron diffusion in polysilicon-on-silicon structures using a rapid thermal anneal step for ultra-shallow junction formation

Sultan, A. / Batra, S. / Lux, G. E. / Banerjee, S.

Modeling of boron diffusion in polysilicon-on-silicon structures using a rapid thermal anneal step for ultra-shallow junction formation

Sultan, A. / Batra, S. / Lux, G. E. / Banerjee, S.

Access

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Check availability in my library

Order at Subito €

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Document information

Title:

Modeling of boron diffusion in polysilicon-on-silicon structures using a rapid thermal anneal step for ultra-shallow junction formation

Contributors:

Sultan, A. (author) / Batra, S. (author) / Lux, G. E. (author) / Banerjee, S. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 32 ; 25

Publication date:

1995-01-01

Size:

25 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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