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    Deposition of CN~x thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

    New search for: Grueger, H.
    New search for: Selbmann, D.
    New search for: Wolf, E.
    New search for: Leonhardt, A.

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    Deposition of CN~x thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

    New search for: Grueger, H.
    New search for: Selbmann, D.
    New search for: Wolf, E.
    New search for: Leonhardt, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Deposition of CN~x thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

    New search for: Grueger, H.
    New search for: Selbmann, D.
    New search for: Wolf, E.
    New search for: Leonhardt, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Deposition of CN~x thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

    Contributors:

    Grueger, H. (author) / Selbmann, D. (author) / Wolf, E. (author) / Leonhardt, A. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 32 ; 2849-2853

    Publication date:

    1997-01-01

    Size:

    5 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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