Study of diffusion barrier properties of ionized metal plasma (IMP) deposited tantalum (Ta) between Cu and SiO"2: Fid-Bau Portal

Study of diffusion barrier properties of ionized metal plasma (IMP) deposited tantalum (Ta) between Cu and SiO"2

Lee, Y.K. / Maung Latt, K. / JaeHyung, K. / Osipowicz, T. / Lee, K.

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Study of diffusion barrier properties of ionized metal plasma (IMP) deposited tantalum (Ta) between Cu and SiO"2

Lee, Y.K. / Maung Latt, K. / JaeHyung, K. / Osipowicz, T. / Lee, K.

Study of diffusion barrier properties of ionized metal plasma (IMP) deposited tantalum (Ta) between Cu and SiO"2

Lee, Y.K. / Maung Latt, K. / JaeHyung, K. / Osipowicz, T. / Lee, K.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Study of diffusion barrier properties of ionized metal plasma (IMP) deposited tantalum (Ta) between Cu and SiO"2

Contributors:

Lee, Y.K. (author) / Maung Latt, K. (author) / JaeHyung, K. (author) / Osipowicz, T. (author) / Lee, K. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 68 ; 99 - 103

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Latt, K. M. / Lee, Y. K. / Seng, H. L. et al. | British Library Online Contents | 2001

Study of diffusion barrier properties of ionized metal plasma (IMP) deposited TaN between Cu and SiO2

Lee, Y. K. / Maung Latt, K. / Jaehyung, K. et al. | British Library Online Contents | 2000

Behaviour of ionized metal plasma deposited Ta diffusion barrier between Cu and SiO2

Maung Latt, K. / Park, H. S. / Li, S. et al. | British Library Online Contents | 2002

Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2

Lee, Y. K. / Maung Latt, K. / Li, S. et al. | British Library Online Contents | 2000

Comparative analysis and study of ionized metal plasma (IMP)-Cu and chemical vapor deposition (CVD)-Cu on diffusion barrier properties of IMP-TaN on SiO2

Lee, Y. K. / Latt, K. M. / JaeHyung, K. et al. | British Library Online Contents | 2000