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    Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO~2/Si structure

    New search for: Lee, Y. K.
    New search for: Latt, K. M.
    New search for: Jaehyung, K.
    New search for: Osipowicz, T.
    New search for: Chiam, S.-Y.
    New search for: Lee, K.

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    Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO~2/Si structure

    New search for: Lee, Y. K.
    New search for: Latt, K. M.
    New search for: Jaehyung, K.
    New search for: Osipowicz, T.
    New search for: Chiam, S.-Y.
    New search for: Lee, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO~2/Si structure

    New search for: Lee, Y. K.
    New search for: Latt, K. M.
    New search for: Jaehyung, K.
    New search for: Osipowicz, T.
    New search for: Chiam, S.-Y.
    New search for: Lee, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO~2/Si structure

    Contributors:

    Lee, Y. K. (author) / Latt, K. M. (author) / Jaehyung, K. (author) / Osipowicz, T. (author) / Chiam, S.-Y. (author) / Lee, K. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 35 ; 5857-5860

    Publication date:

    2000-01-01

    Size:

    4 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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