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A novel atomic doping technology for ultra-shallow junction of SOI-MOSFETs

Koh, K. W. / Oh, H. J. / Choi, H. / Kurino, H. / Koyanagi, M.

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A novel atomic doping technology for ultra-shallow junction of SOI-MOSFETs

Koh, K. W. / Oh, H. J. / Choi, H. / Kurino, H. / Koyanagi, M.

A novel atomic doping technology for ultra-shallow junction of SOI-MOSFETs

Koh, K. W. / Oh, H. J. / Choi, H. / Kurino, H. / Koyanagi, M.

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Check availability in my library

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Document information

Title:

A novel atomic doping technology for ultra-shallow junction of SOI-MOSFETs

Contributors:

Koh, K. W. (author) / Oh, H. J. (author) / Choi, H. (author) / Kurino, H. (author) / Koyanagi, M. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 435 - 438

Publication date:

2002-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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