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Mechanical stress in PECVD a-SiC:H: aging and plasma treatments effects

Jousseaume, V. / Rochat, N. / Favennec, L. / Renault, O. / Passemard, G.

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Mechanical stress in PECVD a-SiC:H: aging and plasma treatments effects

Jousseaume, V. / Rochat, N. / Favennec, L. / Renault, O. / Passemard, G.

Mechanical stress in PECVD a-SiC:H: aging and plasma treatments effects

Jousseaume, V. / Rochat, N. / Favennec, L. / Renault, O. / Passemard, G.

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Check availability in my library

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Document information

Title:

Mechanical stress in PECVD a-SiC:H: aging and plasma treatments effects

Contributors:

Jousseaume, V. (author) / Rochat, N. (author) / Favennec, L. (author) / Renault, O. (author) / Passemard, G. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 301-305

Publication date:

2004-01-01

Size:

5 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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