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Nanocrystalline silicon thin films prepared by low pressure planar inductively coupled plasma

Raha, D. / Das, D.

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Nanocrystalline silicon thin films prepared by low pressure planar inductively coupled plasma

Raha, D. / Das, D.

Nanocrystalline silicon thin films prepared by low pressure planar inductively coupled plasma

Raha, D. / Das, D.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Nanocrystalline silicon thin films prepared by low pressure planar inductively coupled plasma

Contributors:

Raha, D. (author) / Das, D. (author)

Published in:

APPLIED SURFACE SCIENCE ; 276 ; 249-257

Publication date:

2013-01-01

Size:

9 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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