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    Study on Deposition of Amorphous DLC-Si Films by RF-PECVD

    New search for: Tang, J.L.
    New search for: Wang, J.
    New search for: Fu, Y.

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    Study on Deposition of Amorphous DLC-Si Films by RF-PECVD

    New search for: Tang, J.L.
    New search for: Wang, J.
    New search for: Fu, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Study on Deposition of Amorphous DLC-Si Films by RF-PECVD

    New search for: Tang, J.L.
    New search for: Wang, J.
    New search for: Fu, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Study on Deposition of Amorphous DLC-Si Films by RF-PECVD

    Contributors:

    Tang, J.L. (author) / Wang, J. (author) / Fu, Y.

    Published in:

    Advances in Optics Manufacture ; 244-247

    KEY ENGINEERING MATERIALS ; 552

    Publication date:

    2013-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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