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A platform for research: civil engineering, architecture and urbanism
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS MEMBER
To provide a plasma processing apparatus or a processing chamber inner member in which the generation of particles is reduced and the processing yield is improved.SOLUTION: A plasma processing apparatus includes a processing chamber disposed inside a vacuum vessel and in which plasma is formed, and a member constituting an inner wall surface of the processing chamber, which is a member disposed on the surface exposed to the plasma and having a coating film formed by spraying yttrium fluoride or a material containing the same, and the ratio of the yttrium fluoride constituting the film or the material containing the same to the entire tetragonal crystal is 60% or more.SELECTED DRAWING: Figure 1
【課題】パーティクルの発生を低減して処理の歩留まりを向上させたプラズマ処理装置またはその処理室内部部材を提供する。【解決手段】真空容器内部に配置されその内部でプラズマが形成される処理室と、この処理室の内壁表面を構成する部材であって前記プラズマに曝される表面に配置されフッ化イットリウム又はこれを含む材料が溶射されて形成された皮膜を有した部材とを備え、前記皮膜を構成するフッ化イットリウムまたはこれを含む材料の直方晶の結晶の全体に対する比率が６０％以上であるプラズマ処理装置。【選択図】 図１
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS MEMBER
To provide a plasma processing apparatus or a processing chamber inner member in which the generation of particles is reduced and the processing yield is improved.SOLUTION: A plasma processing apparatus includes a processing chamber disposed inside a vacuum vessel and in which plasma is formed, and a member constituting an inner wall surface of the processing chamber, which is a member disposed on the surface exposed to the plasma and having a coating film formed by spraying yttrium fluoride or a material containing the same, and the ratio of the yttrium fluoride constituting the film or the material containing the same to the entire tetragonal crystal is 60% or more.SELECTED DRAWING: Figure 1
【課題】パーティクルの発生を低減して処理の歩留まりを向上させたプラズマ処理装置またはその処理室内部部材を提供する。【解決手段】真空容器内部に配置されその内部でプラズマが形成される処理室と、この処理室の内壁表面を構成する部材であって前記プラズマに曝される表面に配置されフッ化イットリウム又はこれを含む材料が溶射されて形成された皮膜を有した部材とを備え、前記皮膜を構成するフッ化イットリウムまたはこれを含む材料の直方晶の結晶の全体に対する比率が６０％以上であるプラズマ処理装置。【選択図】 図１
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS MEMBER
プラズマ処理装置およびプラズマ処理装置用部材
UEDA KAZUHIRO (author) / IKENAGA KAZUYUKI (author) / TAMURA SATOYUKI (author) / SUMIYA MASAHIRO (author)
2019-10-31
Patent
Electronic Resource
Japanese
Member for plasma processing apparatus and plasma processing apparatus with the same
| European Patent Office | 2023
| European Patent Office | 2020
| European Patent Office | 2020